SILICON CARBIDE CANTILEVER SLURRY
Application Areas: In diffusion furnaces and high-temperature oxidation diffusion furnaces used in the semiconductor manufacturing industry to perform thermal growth and oxidation of silicon wafers, the cantilever paddle is a key component of the wafer loading system to ensure wafer and furnace tube uniformity for more uniform diffusion and oxidation. Silicon carbide cantilever paddles are characterized by high strength, high purity, high thermal conductivity, no porosity, resistance to acid and alkali corrosion, no contamination at high temperatures, good thermal shock stability, and high loading capacity. Combined with a coefficient of thermal expansion similar to that of LPCVD coatings, the use of silicon carbide cantilever paddles in LPCVDs can significantly extend maintenance cleaning cycles and greatly reduce contamination.
Description
One of the primary advantages of the silicon carbide suspension slurry is its ability to deliver consistent and uniform results. The slurry is able to provide a smooth finish and excellent surface quality, ensuring that the machined parts are free from scratches, cracks or other defects.
Another benefit of silicon carbide suspension slurry is that it is environmentally friendly. The slurry does not contain any hazardous compounds or toxic chemicals, which makes it safe to use and dispose of.
Furthermore, silicon carbide suspension slurry is highly cost-effective as it significantly reduces material wastage and processing time. The slurry is able to remove material at a faster rate than traditional grinding and polishing techniques, thus increasing the efficiency of the manufacturing process.
